Modulation of the laser-induced phase transition of VO2/W-TiO2 n-n heterojunction

Authors

  • Weizheng Shi School of Materials Science and Engineering, Tiangong University, Tianjin, 300387 China
  • Leran Zhao School of Materials Science and Engineering, Tiangong University, Tianjin, 300387 China
  • Qiujing Xu School of Materials Science and Engineering, Tiangong University, Tianjin, 300387 China
  • Yushan Zheng School of Materials Science and Engineering, Tiangong University, Tianjin, 300387 China
  • Juncheng Liu School of Materials Science and Engineering, Tiangong University, Tianjin, 300387 China https://orcid.org/0000-0002-1479-6762

DOI:

https://doi.org/10.37256/jeee.4220257157

Keywords:

VO2 film, heterojunction, phase transition threshold, infrared switching efficiency, laser-induced phase transition

Abstract

To solve the contradiction between the low phase transition threshold and the infrared switching efficiency (r) of VO2, the VO2/W-TiO2n-n heterojunction was fabricated on the K9 glass substrate with the magnetron sputtering. The effects of W doping for TiO2 layer on the heterojunction phase transition performance were investigated. An appropriate W doping increases the carrier concentration (n) and its mobility (μ), thereby reducing both the thermotropic phase transition threshold (Tc) and the laser-induced phase transition threshold (Pc) of the heterojunction. The heterojunction doped 1.37 at% W exhibits the optimal comprehensive performance. The r of the heterojunction is up to 56.8%, the Tc decreases to 54.3 °C, and the Pc to 51.8 W/cm².

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Published

2025-09-02

How to Cite

[1]
W. Shi, L. Zhao, Q. Xu, Y. Zheng, and J. Liu, “Modulation of the laser-induced phase transition of VO2/W-TiO2 n-n heterojunction”, J. Electron. Electric. Eng., vol. 4, no. 2, pp. 166–182, Sep. 2025.