In Depth Parasitic Capacitance Analysis on GaN-HEMTs with Recessed MIS Gate

Authors

  • Romeo Kom Kammeugne French Alternative Energies and Atomic Energy Commission-Laboratory of Electronics and Information Technology (CEA-LETI), Micro and Nanotechnologies Innovation Campus (MINATEC), University of Grenoble Alpes, Grenoble, France
  • Charles Leroux French Alternative Energies and Atomic Energy Commission-Laboratory of Electronics and Information Technology (CEA-LETI), Micro and Nanotechnologies Innovation Campus (MINATEC), University of Grenoble Alpes, Grenoble, France
  • Tadeu Mota Frutuoso French Alternative Energies and Atomic Energy Commission-Laboratory of Electronics and Information Technology (CEA-LETI), Micro and Nanotechnologies Innovation Campus (MINATEC), University of Grenoble Alpes, Grenoble, France
  • Jacques Cluzel French Alternative Energies and Atomic Energy Commission-Laboratory of Electronics and Information Technology (CEA-LETI), Micro and Nanotechnologies Innovation Campus (MINATEC), University of Grenoble Alpes, Grenoble, France
  • Laura Vauche French Alternative Energies and Atomic Energy Commission-Laboratory of Electronics and Information Technology (CEA-LETI), Micro and Nanotechnologies Innovation Campus (MINATEC), University of Grenoble Alpes, Grenoble, France
  • Romain Gwoziecki French Alternative Energies and Atomic Energy Commission-Laboratory of Electronics and Information Technology (CEA-LETI), Micro and Nanotechnologies Innovation Campus (MINATEC), University of Grenoble Alpes, Grenoble, France
  • Xavier Garros French Alternative Energies and Atomic Energy Commission-Laboratory of Electronics and Information Technology (CEA-LETI), Micro and Nanotechnologies Innovation Campus (MINATEC), University of Grenoble Alpes, Grenoble, France
  • Matthew Charles French Alternative Energies and Atomic Energy Commission-Laboratory of Electronics and Information Technology (CEA-LETI), Micro and Nanotechnologies Innovation Campus (MINATEC), University of Grenoble Alpes, Grenoble, France
  • Edwige Bano Institute of Microelectronics, Electromagnetism and Photonics-Laboratory of Hyperfrequencies and Characterization (IMEP-LAHC), Micro and Nanotechnologies Innovation Campus (MINATEC), University of Grenoble Alpes, Grenoble, France
  • Gerard Ghibaudo Institute of Microelectronics, Electromagnetism and Photonics-Laboratory of Hyperfrequencies and Characterization (IMEP-LAHC), Micro and Nanotechnologies Innovation Campus (MINATEC), University of Grenoble Alpes, Grenoble, France https://orcid.org/0000-0001-9901-0679

DOI:

https://doi.org/10.37256/jeee.1120221684

Keywords:

electrical characterization, modeling, power semiconductor devices, gate length, recess depth, normally-off, HEMT, GaN, 2D electron gas (2DEG), parasitic capacitance, 2D simulation

Abstract

In this study, parasitic coupling capacitance behavior on GaN devices with recessed MIS-gate is analysed in depth by combining experimental data, 2D-simulations, analytical calculations, and TEM imaging. This enabled to highlight the second channel formation. A new analytical model to determine the contribution of the active channel and the different coupling parasitic capacitances from a gate-to-channel capacitance Cgc curve of a GaN MIS-HEMT is proposed. This also enables the evaluation of the respective contribu-tions of all components such as the passivation layer and gate field plate capacitances in the parasitic ca-pacitance and effective gate length evaluation of GaN devices with recessed MIS gate, which could be useful for reliable parameter extraction, device modeling and optimization.

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Published

2022-10-18

How to Cite

[1]
R. K. Kammeugne, “In Depth Parasitic Capacitance Analysis on GaN-HEMTs with Recessed MIS Gate”, J. Electron. Electric. Eng., vol. 1, no. 1, pp. 12–22, Oct. 2022.